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Hexamethyldisilazane (HMDS) CAS Number: 999-97-3

CAS No. 999-97-3

TESTING DATE August, 06, 2018

DESCRIPTION OF GOODS HEXAMETHYLDISILAZANE

QUANTITY 100G

BATCH NO. 180803-589

20+ years supplying history;

No claims;

Good and stable quality; Stable supplying;

SGS testing approved; EMTEK, SRICI tested; ISO:90012/ 2015 certified, AAA Credit certified;

Delivery Time: 15-20 days;

Audit acceptable;

Competitive price;

Bigbags Packing; On pallets; IBC packing;

Specification:
Testing Item Standard RESULT
Content % ≥ 99.0 Min 99.58
Appearance Colorless transparent liquid Pass
Silicon ether content % ≤ 0.50 0.15

Packages:

Hexamethyldisilazane 4Hexamethyldisilazane 5
Hexamethyldisilazane 6Hexamethyldisilazane 7

Handling

1. Flammable and moisture sensitive — reacts with water to form ammonia and hexamethyldisiloxane.

2. Avoid breathing vapors or mist.

3. Avoid contact with skin, eyes, and clothing.

4. Use only in well-ventilated areas with local exhaust ventilation.

5. Wear appropriate PPE: chemical-resistant gloves (e.g., nitrile/butyl), safety goggles/face shield, and protective clothing.

6. Keep away from heat, sparks, open flames, and hot surfaces.

7. Ground and bond containers during transfer to prevent static discharge.

8. Avoid contact with water, acids, and oxidizing agents.

9. Ensure eyewash stations and safety showers are accessible.

Storage

1. Store in a cool, dry, well-ventilated area away from moisture and humidity.

2. Keep container tightly closed under dry inert gas (e.g., nitrogen) if possible.

3. Protect from heat, ignition sources, and direct sunlight.

4. Store away from oxidizing agents, acids, and water.

5. Use approved flammable liquid storage areas and containers.

6. Follow local regulations for storage of flammable and moisture-sensitive chemicals.

APPLICATION SCENARIOS

1. Semiconductor & Microelectronics (Primary Application)

HMDS is extensively used as an adhesion promoter in photolithography processes.

Applications include:

Wafer surface priming

Photoresist adhesion enhancement

Surface dehydration treatment

HMDS reacts with surface hydroxyl groups (–OH) on silicon wafers to form hydrophobic trimethylsilyl-terminated surfaces, improving resist uniformity and pattern fidelity.

2. Silylation Reagent in Chemical Synthesis

HMDS is a versatile trimethylsilyl (TMS) donor used for:

Protection of alcohols, amines, and acids

Formation of trimethylsilyl derivatives

Dehydration reactions

Catalyst activation

It is widely applied in pharmaceutical and fine chemical synthesis.

3. Surface Hydrophobization

HMDS is used to render surfaces hydrophobic by reacting with hydroxyl-containing substrates such as:

Silica

Glass

Metal oxides

Nanoparticles

This enhances moisture resistance and dispersion performance.

4. Moisture Scavenger & Drying Agent

Due to its high reactivity toward water, HMDS functions as:

Moisture scavenger in coatings and sealants

Drying agent in organic synthesis

Stabilizer for moisture-sensitive formulations

5. Silicone and Specialty Materials

HMDS serves as an intermediate in the production of:

Functional silanes

Silicone resins

Modified polysiloxanes

Advanced organosilicon materials

Hexamethyldisilazane 1
Hexamethyldisilazane 2
Hexamethyldisilazane 3
010203

OUR MARKET

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